The final material, WS20L5, demonstrated impressive resistance when exposed to a 2273 K plasma flame, with a mass ablation rate of only 0.463 mg/s and a linear ablation rate of 0.311 μm/s ...

Abstract: In this review article, various aspects of plasma etching for very large scale integrated (VLSI) circuit technology are presented. The motivation for using plasma etching and the advantages ...

This proprietary process, applied to fully finished ceramic pieces, involves exposure to plasma flame at 20,000℃. The result? A shimmering, metallic material which contains no metal. Lightweight and ...